Hybrid PVD System
Introduction
Hybrid PVD system operates based on both cathodic arc and sputtering processes. In cathodic arc deposition, an electric arc is used to vaporize material from a target, while in sputtering atoms are ejected from a target as a result of the bombardment of the target by high energy particles. Then the vaporized/ejected material condenses on a substrate, forming a thin film. Hybrid PVD is widely used to synthesize extremely hard films to protect the surface of cutting tools and extend their life remarkably.
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Description
Application
Deposition of hard thin films, super hard coatings and nanocomposite coatings, including TiN, TiAlN, CrN, ZrN, AlCrTiN and TiAlSiN.
Certificates and standards
- Certificate of Nanotechnology
Nanotechnology in Product
A wide variety of hard thin films, super hard nanostructured coatings and nanocomposite coatings can be synthesized by Hybrid PVD system.
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